File:Ref2-1977 JAP v49 No4 p2478.pdf
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Ref2-1977_JAP_v49_No4_p2478.pdf (file size: 880 KB, MIME type: application/pdf)
Reference 2 in the Summary Document: Journal of Applied Physics paper from 1978: “Dielectric breakdown in electrically stressed thin films of thermal SiO2”
Ref3-US4115914.pdf
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| Date/Time | Dimensions | User | Comment | |
|---|---|---|---|---|
| current | 22:22, 12 October 2011 | (880 KB) | Bberg (talk | contribs) | Reference 2 in the Summary Document: Journal of Applied Physics paper from 1978: “Dielectric breakdown in electrically stressed thin films of thermal SiO2” |
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